● 구입가격

 

● 시설장비 구성 및 용도

 

● 시설장비 구성 및 성능

- Wavelength range : 380 nm~1,000 nm (UV Option: 240 nm-1,000 nm)
- Beam spot size : ≥ 1.5 mm

-  Measuring constants : Film thickness, n, k vs λ

- Thickness range : sub Å ~ 10 μm (depends on film type)

- Number of layers : Up to 10 layers (depends on film type)

- Throughput(Foot note 1) : 10~15sec. per point (depends on film type) - Option: High speed measurement 1.5sec. per point

- Repeatability(Foot note 2) (3σ) : ± 0.3 Å on 10 times measurement

- Dispersion relations : Cauchy, Sellmeier, Lorentz, Tauc-Lorentz, Quantum-Mechanical and more

- Providing features : Refractive Index, Extinction coefficient and optical band gap

  - Film density and composition

  - Material’s dielectrics function library

  - User defined model capability

  - Data import & export functions

  - Extendable library      

 

● UV system - Spectral range 240 nm ~ 1,000 nm
- Light source : Deuterium lamp Image system

- CCD Camera and Video monitor

 

● Automatic mapping

- R-θ, X-Y moving stage
- Stage size 8 inch 200mm, 12 inch 300mm

 

● Reflectometer system(Foot note 3)

- Refer to Elli-RP Specification

 

● High speed measurement

 - 1.5 sec. per point (depends on film type)

 

● 세부사용료

  - Wafer(9pt) + 10,000원 / wf

  - piece(2pt) + 10,000원 / wf

 

● 미래창조관 101호

 

● 기기사용 중 본인 부주의로 인한 고장은 책임지고 보상해야함.

 

● 장비담장자 ☎031-214-0440